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Standards and norms
Fastmicro products are developed and tested in accordance with the norms and standards for particle measurement and cleanliness control.
Semiconductor fabrication demands the world's most rigorous contamination control, with ISO 14644 setting the global benchmark.
Consistently meeting and maintaining these standards is essential for high yield, process efficiency, and regulatory compliance.
This commitment is reflected in our strict quality policies and the rigorous certification of our products and processes.
Meeting standards and norms
ISO
ISO 14644-9:2022
Cleanrooms and associated controlled environments. Part 9, assessment of surface cleanliness for particle contamination.
ISO
ISO 14644-17:2021
Cleanrooms and associated controlled environments. Part 17, particle deposition rate applications.
SEMI
SEMI E195-092
Test method using adhesive replacement substrates to assess particulate surface contamination on critical chamber components.
ASTM
ASTM E1216-21
Standard practice for sampling for particulate contamination by tape lift.
IEST
IEST-STD-CC1246E
Product cleanliness levels, applications, requirements, and determination.
IEST
IEST-RP-CC005
Gloves and finger cots used in cleanrooms and other controlled environments.
ESA
ECSS-Q-ST-70-01C Rev.1
Cleanliness and contamination control (15 October 2025).
NASA
19960044619
Contamination control engineering design guidelines for the aerospace community.
ASML
GSA 07 9410
Cleanliness particles, Grade 1.
IMS Nanofabrication
120947085-08
Cleanliness requirements for parts and assemblies, PC3 and PC4.
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